Enhanced Self-Diffusion on Cu(111) by Trace Amounts of S: Chemical-Reaction-Limited Kinetics

W. L. Ling, N. C. Bartelt, K. Pohl, J. de la Figuera, R. Q. Hwang, and K. F. McCarty
Phys. Rev. Lett. 93, 166101 – Published 13 October 2004

Abstract

We find that less than 0.01 monolayer of S can enhance surface self-diffusion on Cu(111) by several orders of magnitude. The measured dependence of two-dimensional island decay rates on S coverage (θS) is consistent with the proposal that Cu3S3 clusters are responsible for the enhancement. Unexpectedly, the decay and ripening are diffusion limited with very low and very high θS but not for intermediate θS. To explain this result we propose that surface mass transport in the intermediate region is limited by the rate of reaction to form Cu3S3 clusters on the terraces.

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  • Received 28 May 2004

DOI:https://doi.org/10.1103/PhysRevLett.93.166101

©2004 American Physical Society

Authors & Affiliations

W. L. Ling, N. C. Bartelt, K. Pohl*, J. de la Figuera, R. Q. Hwang, and K. F. McCarty

  • Sandia National Laboratories, Livermore, California 94551-0969, USA

  • *Present address: University of New Hampshire, Durham, NH, USA.
  • Present address: Universidad Autónoma de Madrid, Spain.
  • Present address: Brookhaven National Laboratory, Upton, NY, USA.

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Issue

Vol. 93, Iss. 16 — 15 October 2004

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