Atomic-Scale Pathway of the Pyramid-to-Dome Transition during Ge Growth on Si(001)

F. Montalenti, P. Raiteri, D. B. Migas, H. von Känel, A. Rastelli, C. Manzano, G. Costantini, U. Denker, O. G. Schmidt, K. Kern, and Leo Miglio
Phys. Rev. Lett. 93, 216102 – Published 17 November 2004

Abstract

By high resolution scanning tunneling microscopy, we investigate the morphological transition from pyramid to dome islands during the growth of Ge on Si(001). We show that pyramids grow from top to bottom and that, from a critical size on, incomplete facets are formed. We demonstrate that the bunching of the steps delimiting these facets evolves into the steeper dome facets. Based on first principles and Tersoff-potential calculations, we develop a microscopic model for the onset of the morphological transition, able to reproduce closely the experimentally observed behavior.

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  • Received 10 June 2004

DOI:https://doi.org/10.1103/PhysRevLett.93.216102

©2004 American Physical Society

Authors & Affiliations

F. Montalenti1,*, P. Raiteri1, D. B. Migas1, H. von Känel2, A. Rastelli2,3, C. Manzano3, G. Costantini3, U. Denker3, O. G. Schmidt3, K. Kern3, and Leo Miglio1

  • 1INFM and L-NESS, Dipartimento di Scienza dei Materiali della Università degli Studi di Milano-Bicocca, Via Cozzi 53, I-20125 Milano, Italy
  • 2INFM and L-NESS, Dipartimento di Fisica del Politecnico di Milano, Via Anzani 52, I-22100, Como, Italy
  • 3Max Planck Institut für Festkörperforschung, Heisenbergstrasse 1, D-70569 Stuttgart, Germany

  • *Email address: francesco.montalenti@unimib.it

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Vol. 93, Iss. 21 — 19 November 2004

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