Quantum Oscillations in the Layer Structure of Thin Metal Films

P. Czoschke, Hawoong Hong, L. Basile, and T.-C. Chiang
Phys. Rev. Lett. 91, 226801 – Published 25 November 2003

Abstract

Understanding the underlying physical principles that determine the internal structure of objects at the atomic scale is critical for the advancement of nanoscale science. We have performed synchrotron x-ray diffraction studies to determine the structural properties of smooth Pb films with varying thicknesses of 6 to 18 monolayers deposited on a Si(111) substrate at 110 K. We observe quasibilayer variations in the atomic interlayer spacings of the films consistent with charge density oscillations due to quantum confinement of conduction electrons and surface-interface interference effects. Quantum oscillations in atomic step height are also deduced.

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  • Received 7 July 2003

DOI:https://doi.org/10.1103/PhysRevLett.91.226801

©2003 American Physical Society

Authors & Affiliations

P. Czoschke1,2, Hawoong Hong2, L. Basile1,2, and T.-C. Chiang1,2

  • 1Department of Physics, University of Illinois at Urbana-Champaign, 1110 W. Green Street, Urbana, Illinois 61801-3080, USA
  • 2Frederick Seitz Materials Research Laboratory, University of Illinois at Urbana-Champaign, 104 S. Goodwin Avenue, Urbana, Illinois 61801-2902, USA

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Issue

Vol. 91, Iss. 22 — 28 November 2003

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