Adatom Kinetics On and Below the Surface: The Existence of a New Diffusion Channel

Jörg Neugebauer, Tosja K. Zywietz, Matthias Scheffler, John E. Northrup, Huajie Chen, and R. M. Feenstra
Phys. Rev. Lett. 90, 056101 – Published 6 February 2003

Abstract

Employing density-functional theory in combination with scanning tunneling microscopy, we demonstrate that a thin metallic film on a semiconductor surface may open an efficient and hitherto not expected diffusion channel for lateral adatom transport: adatoms may prefer diffusion within this metallic layer rather than on top of the surface. Based on this concept, we interpret recent experiments: We explain why and when In acts as a surfactant on GaN surfaces, why Ga acts as an autosurfactant, and how this mechanism can be used to optimize group-III nitride growth.

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  • Received 5 June 2002

DOI:https://doi.org/10.1103/PhysRevLett.90.056101

©2003 American Physical Society

Authors & Affiliations

Jörg Neugebauer, Tosja K. Zywietz, and Matthias Scheffler

  • Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-14195 Berlin, Germany

John E. Northrup

  • Palo Alto Research Center, 3333 Coyote Hill Road, Palo Alto, California 94304

Huajie Chen and R. M. Feenstra

  • Department of Physics, Carnegie Mellon University, Pittsburgh, Pennsylvania 15213

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Issue

Vol. 90, Iss. 5 — 7 February 2003

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