Abstract
We describe broad new classes of three-dimensional (3D) structures which, when made of silicon, exhibit robust 3D photonic band gaps of up to of the gap center frequency. The proposed photonic crystals are readily amenable to very high precision microfabrication using established techniques such as x-ray lithography and template inversion. Each architecture consists of a set of oriented cylindrical pores emanating from a two-dimensional (2D) square lattice mask with a two-point basis. Large bandwidth, microcircuits for light may be incorporated within the resulting photonic band gaps using an intercalated 2D photonic crystal layer.
- Received 16 December 2002
DOI:https://doi.org/10.1103/PhysRevLett.90.233901
©2003 American Physical Society