Origin of the Residual Acceptor Ground-State Splitting in Silicon

D. Karaiskaj, G. Kirczenow, M. L. W. Thewalt, R. Buczko, and M. Cardona
Phys. Rev. Lett. 90, 016404 – Published 10 January 2003

Abstract

The residual ground-state splitting of acceptors in high-quality silicon has been studied intensely by different experimental techniques for several decades. Recently, photoluminescence studies of isotopically pure silicon revealed the ground-state splitting to result from the random distribution of isotopes in natural silicon. Here we present a new model that explains these surprising experimental results, and discuss the implications for acceptor ground-state splittings observed in other isotopically mixed semiconductors, as well as for the acceptor ground state in semiconductor alloys.

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  • Received 25 September 2002

DOI:https://doi.org/10.1103/PhysRevLett.90.016404

©2003 American Physical Society

Authors & Affiliations

D. Karaiskaj, G. Kirczenow, and M. L. W. Thewalt

  • Department of Physics, Simon Fraser University, Burnaby, British Columbia, Canada V5A 1S6

R. Buczko

  • Institute of Physics, Polish Academy of Sciences, Al. Lotników 32/46, PL 02-668, Warsaw, Poland

M. Cardona

  • Max-Planck-Institut für Festkörperforschung, 70569 Stuttgart, Germany

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Issue

Vol. 90, Iss. 1 — 10 January 2003

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