Structure, Properties, and Dynamics of Oxygen Vacancies in Amorphous SiO2

Zhong-Yi Lu, C. J. Nicklaw, D. M. Fleetwood, R. D. Schrimpf, and S. T. Pantelides
Phys. Rev. Lett. 89, 285505 – Published 30 December 2002; Erratum Phys. Rev. Lett. 91, 039901 (2003)

Abstract

Oxygen vacancies in SiO2 have long been regarded as bistable, forming a Si-Si dimer when neutral and a puckered configuration when positively charged. We report first-principles calculations of O vacancies in amorphous SiO2 supercells that unveil significantly more complex behavior. We find that the vast majority of O vacancies do not pucker after capture of a hole, but are shallow traps. The remaining vacancies exhibit two distinct types of puckering. Upon capturing an electron, one type forms a metastable dipole, while the other collapses to a dimer. A statistical distribution of O vacancies is obtained, and the implications for charge transport and trapping in SiO2 are discussed.

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  • Received 1 May 2002

DOI:https://doi.org/10.1103/PhysRevLett.89.285505

©2002 American Physical Society

Erratum

Erratum: Structure, Properties, and Dynamics of Oxygen Vacancies in Amorphous SiO2 [Phys. Rev. Lett.PRLTAO0031-9007 89, 285505 (2002)]

Zhong-Yi Lu, C. J. Nicklaw, D. M. Fleetwood, R. D. Schrimpf, and S. T. Pantelides
Phys. Rev. Lett. 91, 039901 (2003)

Authors & Affiliations

Zhong-Yi Lu1, C. J. Nicklaw2, D. M. Fleetwood2,1, R. D. Schrimpf2, and S. T. Pantelides1,3

  • 1Department of Physics and Astronomy, Vanderbilt University, Nashville, Tennessee 37235
  • 2Department of Electrical Engineering and Computer Science, Vanderbilt University, Nashville, Tennessee 37235
  • 3Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831

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Issue

Vol. 89, Iss. 28 — 31 December 2002

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