Diffusion and Reactions of Hydrogen in F2-Laser-Irradiated SiO2 Glass

Koichi Kajihara, Linards Skuja, Masahiro Hirano, and Hideo Hosono
Phys. Rev. Lett. 89, 135507 – Published 9 September 2002; Erratum Phys. Rev. Lett. 89, 189901 (2002)

Abstract

The diffusion and reactions of hydrogenous species generated by single-pulsed F2 laser photolysis of SiO-H bond in SiO2 glass were studied in situ between 10 and 330 K. Experimental evidence indicates that atomic hydrogen (H0) becomes mobile even at temperatures as low as 30K. A sizable number of H0 dimerize by a diffusion-limited reaction into molecular hydrogen (H2) that may migrate above 200K. Activation energies for the diffusion, inherently scattered due to the structural disorder in glass, are separated into three bands centered at 0.1eV for free H0, 0.2eV presumably for shallow-trapped H0, and 0.4eV for H2.

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  • Received 31 March 2002
  • Publisher error corrected 9 October 2002

DOI:https://doi.org/10.1103/PhysRevLett.89.135507

©2002 American Physical Society

Corrections

9 October 2002

Erratum

Publisher’s Note: Diffusion and Reactions of Hydrogen in F2-Laser-Irradiated SiO2 Glass [Phys. Rev. Lett. 89, 135507 (2002)]

Koichi Kajihara, Linards Skuja, Masahiro Hirano, and Hideo Hosono
Phys. Rev. Lett. 89, 189901 (2002)

Authors & Affiliations

Koichi Kajihara1,*, Linards Skuja1,2, Masahiro Hirano1, and Hideo Hosono1,3

  • 1Transparent Electro-Active Materials Project, ERATO, Japan Science and Technology Corporation, KSP C-1232, 3-2-1 Sakado Takatsu-ku, Kawasaki 213-0012, Japan
  • 2Institute of Solid State Physics, University of Latvia, Kengaraga iela 8, LV1063 Riga, Latvia
  • 3Materials and Structures Laboratory, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

  • *Corresponding author. Email address: k-kajihara@net.ksp.or.jp

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Issue

Vol. 89, Iss. 13 — 23 September 2002

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