Physical Disorder and Optical Properties in the Vacuum Ultraviolet Region of Amorphous SiO2

Hideo Hosono, Yoshiaki Ikuta, Takeru Kinoshita, Kouichi Kajihara, and Masahiro Hirano
Phys. Rev. Lett. 87, 175501 – Published 4 October 2001
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Abstract

The optical absorption of point-defect-free SiO2 glass in the vacuum ultraviolet region is primarily controlled by the concentrations of three- and four-membered ring structures composed of heavily strained Si-O-Si bonds. The main channel of color center formation by F2 excimer laser (7.9 eV) irradiation is not Frenkel-defect generation of oxygen via two-photon absorption processes but a pair generation of E and nonbridging oxygen hole centers by the one-photon excitation of these strained bonds with 7.9 eV photons.

  • Received 12 March 2001

DOI:https://doi.org/10.1103/PhysRevLett.87.175501

©2001 American Physical Society

Authors & Affiliations

Hideo Hosono1,2, Yoshiaki Ikuta1, Takeru Kinoshita2, Kouichi Kajihara1, and Masahiro Hirano1

  • 1Transparent Electro Active Materials, Exploratory Research for Advanced Technology, Japan Science and Technology Corporation, KSP C-1232, Sakato 3-2-1, Takatsu, Kawasaki 213-0012, Japan
  • 2Materials and Structures Laboratory, Tokyo Institute of Technology, Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

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Issue

Vol. 87, Iss. 17 — 22 October 2001

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