Two-Photon Diffraction and Quantum Lithography

Milena D'Angelo, Maria V. Chekhova, and Yanhua Shih
Phys. Rev. Lett. 87, 013602 – Published 14 June 2001
PDFExport Citation

Abstract

We report a proof-of-principle experimental demonstration of quantum lithography. Utilizing the entangled nature of a two-photon state, the experimental results have beaten the classical diffraction limit by a factor of 2. This is a quantum mechanical two-photon phenomenon but not a violation of the uncertainty principle.

  • Received 2 February 2001

DOI:https://doi.org/10.1103/PhysRevLett.87.013602

©2001 American Physical Society

Authors & Affiliations

Milena D'Angelo, Maria V. Chekhova*, and Yanhua Shih

  • Department of Physics, University of Maryland, Baltimore County, Baltimore, Maryland 21250

  • *Permanent address: Department of Physics, Moscow State University, Moscow, Russia.

References (Subscription Required)

Click to Expand
Issue

Vol. 87, Iss. 1 — 2 July 2001

Reuse & Permissions
Access Options
Author publication services for translation and copyediting assistance advertisement

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review Letters

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×