Entangled-State Lithography: Tailoring Any Pattern with a Single State

Gunnar Björk; Luis L. Sánchez-Soto; Jonas Söderholm

doi:10.1103/PhysRevLett.86.4516

Entangled-State Lithography: Tailoring Any Pattern with a Single State

Gunnar Björk, Luis L. Sánchez-Soto, and Jonas Söderholm

Phys. Rev. Lett. 86, 4516 – Published 14 May 2001

Abstract

We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binomial states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a $(N + 1) \times (N + 1)$ grid, occupying a square with the side half a wavelength long, can be generated from a $2 N$ -photon state.

Received 17 November 2000

DOI:https://doi.org/10.1103/PhysRevLett.86.4516

Authors & Affiliations

Gunnar Björk^* and Luis L. Sánchez-Soto

Departamento de Óptica, Facultad de Ciencias Físicas, Universidad Complutense, 28040 Madrid, Spain

Jonas Söderholm

Department of Electronics, Royal Institute of Technology (KTH), Electrum 229, SE-164 40 Kista, Sweden

^*On leave from Department of Electronics, Royal Institute of Technology (KTH), Electrum 229, SE-164 40 Kista, Sweden. Electronic addresses: gunnarb@ele.kth.se; http://www.ele.kth.se/QEO/