Threshold for Potential Sputtering of LiF

G. Hayderer, M. Schmid, P. Varga, H P. Winter, F. Aumayr, L. Wirtz, C. Lemell, J. Burgdörfer, L. Hägg, and C. O. Reinhold
Phys. Rev. Lett. 83, 3948 – Published 8 November 1999
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Abstract

We have measured total sputtering yields for impact of slow ( 100eV) singly and doubly charged ions on LiF. The minimum potential energy necessary to induce potential sputtering (PS) from LiF was determined to be about 10 eV. This threshold coincides with the energy necessary to produce a cold hole in the valence band of LiF by resonant neutralization. This allows the first unambiguous identification of PS induced by cold holes. Further stepwise increase of the sputtering yield with higher projectile potential energies provides evidence for additional defect-mediated sputtering mechanisms operative in alkali halides.

  • Received 18 June 1999

DOI:https://doi.org/10.1103/PhysRevLett.83.3948

©1999 American Physical Society

Authors & Affiliations

G. Hayderer, M. Schmid, P. Varga, H P. Winter, and F. Aumayr*

  • Institut für Allgemeine Physik, TU Wien, Wiedner Hauptstrasse 8-10, A-1040 Vienna, Austria

L. Wirtz, C. Lemell, and J. Burgdörfer

  • Institute for Theoretical Physics, TU Wien, Wiedner Hauptstrasse 8-10, A-1040 Vienna, Austria

L. Hägg1 and C. O. Reinhold2

  • 1Department of Physics and Mathematics, Mid Sweden University, S-851 70 Sundsvall, Sweden
  • 2Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6373

  • *Corresponding author.Email address: aumayr@iap.tuwien.ac.at

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Issue

Vol. 83, Iss. 19 — 8 November 1999

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