Abstract
Surface x-ray diffraction was used to monitor the reaction of Ni on Si(111) at room temperature. Intensity oscillations during deposition signify that a layerwise reaction occurs for the first 30 Å of metal deposited, forming a silicide overlayer with stoichiometry NSi. Structural analysis of the interfacial layers detects an epitaxial and commensurate phase, NSi- , with long range order imposed by the substrate but with very large local atomic displacements. This epitaxial structure remains at the interface as amorphous silicide forms above it.
- Received 15 May 1995
DOI:https://doi.org/10.1103/PhysRevLett.75.2726
©1995 American Physical Society