Hot Carrier Scattering at Interfacial Dislocations Observed by Ballistic-Electron-Emission Microscopy

H. Sirringhaus, E. Y. Lee, and H. von Känel
Phys. Rev. Lett. 73, 577 – Published 25 July 1994
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Abstract

In situ ballistic-electron-emission microscopy (BEEM) has been performed at 77 K on partially strain-relaxed, epitaxial CoSi2/Si(111) films grown by molecular beam epitaxy. Hot electron scattering at individual interfacial dislocations has been observed for the first time by BEEM. Standing wave formation in the metal and changes of the surface electronic structure give rise to significant contrast in BEEM images. Apart from the dislocation- and surface-induced contrast, the interfacial transmission is generally found to be homogeneous.

  • Received 14 February 1994

DOI:https://doi.org/10.1103/PhysRevLett.73.577

©1994 American Physical Society

Authors & Affiliations

H. Sirringhaus, E. Y. Lee, and H. von Känel

  • Laboratorium für Festkörperphysik, Eidgenössische Technische Hochschule Zürich-Hönggerberg, CH-8093 Zürich, Switzerland

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Vol. 73, Iss. 4 — 25 July 1994

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