Abstract
A new time-resolved x-ray method of probing the kinetics of interfacial strains in semiconductor heterostructures is presented. High-resolution synchrotron-radiation measurements of the strain relaxation during rapid thermal annealing show that the lattice dilation of an as-grown quantum-well structure is relieved cooperatively by a series of sluggish discontinuous transitions. Well-defined metastable states of strain are observed between the transitions.
- Received 13 August 1990
DOI:https://doi.org/10.1103/PhysRevLett.66.317
©1991 American Physical Society