Comment on “Robust Formation of Skyrmions and Topological Hall Effect Anomaly in Epitaxial Thin Films of MnSi”

T. L. Monchesky, J. C. Loudon, M. D. Robertson, and A. N. Bogdanov
Phys. Rev. Lett. 112, 059701 – Published 4 February 2014

Abstract

A Comment on the Letter by Y. Li et al., Phys. Rev. Lett. 110, 117202 (2013). The authors of the Letter offer a Reply.

  • Figure
  • Received 6 August 2013

DOI:https://doi.org/10.1103/PhysRevLett.112.059701

© 2014 American Physical Society

Authors & Affiliations

T. L. Monchesky

  • Department of Physics and Atmospheric Science, Dalhousie University, Halifax, Nova Scotia B3H 3J5, Canada

J. C. Loudon

  • Department of Materials Science and Metallurgy, University of Cambridge, 27 Charles Babbage Road, Cambridge CB3 0FS, United Kingdom

M. D. Robertson

  • Department of Physics, Acadia University, Wolfville, Nova Scotia B4P 2R6, Canada

A. N. Bogdanov

  • IFW Dresden, Postfach 270116, D-01171 Dresden, Germany

Comments & Replies

Li et al. Reply

Yufan Li, N. Kanazawa, X. Z. Yu, F. Kagawa, and Y. Tokura
Phys. Rev. Lett. 112, 059702 (2014)

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Original Article

Robust Formation of Skyrmions and Topological Hall Effect Anomaly in Epitaxial Thin Films of MnSi

Yufan Li, N. Kanazawa, X. Z. Yu, A. Tsukazaki, M. Kawasaki, M. Ichikawa, X. F. Jin, F. Kagawa, and Y. Tokura
Phys. Rev. Lett. 110, 117202 (2013)

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Issue

Vol. 112, Iss. 5 — 7 February 2014

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