Electronic Origin of Ultrafast Photoinduced Strain in BiFeO3

Haidan Wen, Pice Chen, Margaret P. Cosgriff, Donald A. Walko, June Hyuk Lee, Carolina Adamo, Richard D. Schaller, Jon F. Ihlefeld, Eric M. Dufresne, Darrell G. Schlom, Paul G. Evans, John W. Freeland, and Yuelin Li
Phys. Rev. Lett. 110, 037601 – Published 18 January 2013
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Abstract

Above-band-gap optical excitation produces interdependent structural and electronic responses in a multiferroic BiFeO3 thin film. Time-resolved synchrotron x-ray diffraction shows that photoexcitation can induce a large out-of-plane strain, with magnitudes on the order of half of one percent following pulsed-laser excitation. The strain relaxes with the same nanosecond time dependence as the interband relaxation of excited charge carriers. The magnitude of the strain and its temporal correlation with excited carriers indicate that an electronic mechanism, rather than thermal effects, is responsible for the lattice expansion. The observed strain is consistent with a piezoelectric distortion resulting from partial screening of the depolarization field by charge carriers, an effect linked to the electronic transport of excited carriers. The nonthermal generation of strain via optical pulses promises to extend the manipulation of ferroelectricity in oxide multiferroics to subnanosecond time scales.

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  • Received 9 July 2012

DOI:https://doi.org/10.1103/PhysRevLett.110.037601

© 2013 American Physical Society

Authors & Affiliations

Haidan Wen1, Pice Chen2, Margaret P. Cosgriff2, Donald A. Walko1, June Hyuk Lee1, Carolina Adamo3, Richard D. Schaller4,5, Jon F. Ihlefeld6, Eric M. Dufresne1, Darrell G. Schlom3,7, Paul G. Evans2, John W. Freeland1, and Yuelin Li1,*

  • 1X-ray Science Division, Argonne National Laboratory, Argonne, Illinois 60439, USA
  • 2Department of Materials Science and Engineering and Materials Science Program, University of Wisconsin–Madison, Madison, Wisconsin 53706, USA
  • 3Department of Materials Science and Engineering, Cornell University, Ithaca, New York 14853, USA
  • 4Center for Nanoscale Materials, Argonne National Laboratory, Argonne, Illinois 60439, USA
  • 5Department of Chemistry, Northwestern University, Evanston, Illinois 60208, USA
  • 6Sandia National Laboratories, Albuquerque, New Mexico 87185, USA
  • 7Kavli Institute at Cornell for Nanoscale Science, Ithaca, New York 14853, USA

  • *ylli@aps.anl.gov

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Issue

Vol. 110, Iss. 3 — 18 January 2013

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