Abstract
We study the weak antilocalization (WAL) effect in topological insulator thin films at low temperatures. The two-dimensional WAL effect associated with surface carriers is revealed in the tilted magnetic field dependence of magnetoconductance. Our data demonstrate that the observed WAL is robust against deposition of nonmagnetic Au impurities on the surface of the thin films, but it is quenched by the deposition of magnetic Fe impurities which destroy the Berry phase of the topological surface states. The magnetoconductance data of a 5 nm film suggests that a crossover from symplectic to unitary classes is observed with the deposition of Fe impurities.
- Received 31 July 2010
DOI:https://doi.org/10.1103/PhysRevLett.106.166805
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