Abstract
To study equilibrium changes in composition, valence, and electronic structure near the surface and into the bulk, we demonstrate the use of a new approach, total-reflection inelastic x-ray scattering, as a sub-keV spectroscopy capable of depth profiling chemical changes in thin films with nanometer resolution. By comparing data acquired under total x-ray reflection and penetrating conditions, we are able to separate the O -edge spectra from a 10 nm thin film from that of the underlying substrate. With a smaller wavelength probe than comparable soft x-ray absorption measurements, we also describe the ability to easily access dipole-forbidden final states, using the dramatic evolution of the La edge with momentum transfer as an example.
- Received 17 November 2009
DOI:https://doi.org/10.1103/PhysRevLett.106.037401
© 2011 The American Physical Society
Synopsis
X-raying the skin
Published 3 February 2011
A new form of x-ray spectroscopy uses total external reflection to reveal the chemical evolution of a surface into a bulk material.
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