Graphene Field-Effect Transistors with Ferroelectric Gating

Yi Zheng, Guang-Xin Ni, Chee-Tat Toh, Chin-Yaw Tan, Kui Yao, and Barbaros Özyilmaz
Phys. Rev. Lett. 105, 166602 – Published 11 October 2010
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Abstract

Recent experiments on ferroelectric gating have introduced a novel functionality, i.e., nonvolatility, in graphene field-effect transistors. A comprehensive understanding in the nonlinear, hysteretic ferroelectric gating and an effective way to control it are still absent. In this Letter, we quantitatively characterize the hysteretic ferroelectric gating using the reference of an independent background doping (nBG) provided by normal dielectric gating. More importantly, we prove that nBG can be used to control the ferroelectric gating by unidirectionally shifting the hysteretic ferroelectric doping in graphene. Utilizing this electrostatic effect, we demonstrate symmetrical bit writing in graphene-ferroelectric field-effect transistors with resistance change over 500% and reproducible no-volatile switching over 105 cycles.

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  • Received 11 March 2010

DOI:https://doi.org/10.1103/PhysRevLett.105.166602

© 2010 The American Physical Society

Authors & Affiliations

Yi Zheng1,2,*, Guang-Xin Ni1,3,*, Chee-Tat Toh1, Chin-Yaw Tan3, Kui Yao3, and Barbaros Özyilmaz1,2,4,*,†

  • 1Department of Physics, 2 Science Drive 3, National University of Singapore, Singapore 117542
  • 2NanoCore, 4 Engineering Drive 3, National University of Singapore, Singapore 117576
  • 3Institute of Material Research and Engineering (IMRE), 3 Research Link, Singapore 117602
  • 4NUS Graduate School for Integrative Sciences and Engineering (NGS), Singapore 117456

  • *Corresponding authors.
  • phyob@nus.edu.sg

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Issue

Vol. 105, Iss. 16 — 15 October 2010

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