Transport of Deposited Atoms throughout Strain-Mediated Self-Assembly

Oussama Moutanabbir, Satoru Miyamoto, Eugene E. Haller, and Kohei M. Itoh
Phys. Rev. Lett. 105, 026101 – Published 6 July 2010

Abstract

Using enriched isotopes, we developed a method to elucidate the long-standing issue of Ge transport governing the strain-driven self-assembly. Here Ge76 was employed to form the 2D metastable layer on a Si(001) surface, while the 3D transition and growth were completed by additional evaporation of Ge70. This isotope tracing combined with the analysis of the Ge-Ge LO phonon enables the tracking of the origin of Ge atoms and their flow towards the growing islands. This atomic transport was quantified based on the quasiharmonic approximation of Ge-Ge vibrations and described using a rate equation model.

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  • Received 10 January 2010

DOI:https://doi.org/10.1103/PhysRevLett.105.026101

©2010 American Physical Society

Authors & Affiliations

Oussama Moutanabbir1,2,*, Satoru Miyamoto1, Eugene E. Haller3,4, and Kohei M. Itoh1

  • 1School of Fundamental Science and Technology, Keio University, 3-14-1 Hiyoshi, Kohoku-ku, Yokohama 223-8522, Japan
  • 2Max Planck Institute of Microstructure Physics, Weinberg 2, Halle (Saale), 06120 Germany
  • 3Department of Materials Science and Engineering, University of California, Berkeley, Berkeley, California 94720-1760, USA
  • 4Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA

  • *moutanab@mpi-halle.mpg.de

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Vol. 105, Iss. 2 — 9 July 2010

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