• Featured in Physics

Self-Sputtering Far above the Runaway Threshold: An Extraordinary Metal-Ion Generator

Joakim Andersson and André Anders
Phys. Rev. Lett. 102, 045003 – Published 27 January 2009
Physics logo

Abstract

When self-sputtering is driven far above the runaway threshold voltage, energetic electrons are made available to produce “excess plasma” far from the magnetron target. Ionization balance considerations show that the secondary electrons deliver the necessary energy to the “remote” zone. Thereby, such a system can be an extraordinarily prolific generator of usable metal ions. Contrary to other known sources, the ion current to a substrate can exceed the discharge current. For gasless self-sputtering of copper, the usable ion current scales exponentially with the discharge voltage.

  • Figure
  • Figure
  • Figure
  • Figure
  • Received 12 September 2008

DOI:https://doi.org/10.1103/PhysRevLett.102.045003

©2009 American Physical Society

Authors & Affiliations

Joakim Andersson and André Anders

  • Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA

See Also

Copper, Sputter Thyself

Don Monroe
Phys. Rev. Focus 23, 4 (2009)

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 102, Iss. 4 — 30 January 2009

Reuse & Permissions
Access Options

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review Letters

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×