Enhanced Relaxation and Intermixing in Ge Islands Grown on Pit-Patterned Si(001) Substrates

T. U. Schülli, G. Vastola, M.-I. Richard, A. Malachias, G. Renaud, F. Uhlík, F. Montalenti, G. Chen, L. Miglio, F. Schäffler, and G. Bauer
Phys. Rev. Lett. 102, 025502 – Published 16 January 2009

Abstract

We compare elastic relaxation and Si-Ge distribution in epitaxial islands grown on both pit-patterned and flat Si(001) substrates. Anomalous x-ray diffraction yields that nucleation in the pits provides a higher relaxation. Using an innovative, model-free fitting procedure based on self-consistent solutions of the elastic problem, we provide compositional and elastic-energy maps. Islands grown on flat substrates exhibit stronger composition gradients and do not show a monotonic decrease of elastic energy with height. Both phenomena are explained using both thermodynamic and kinetic arguments.

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  • Received 24 October 2008

DOI:https://doi.org/10.1103/PhysRevLett.102.025502

©2009 American Physical Society

Authors & Affiliations

T. U. Schülli1,*, G. Vastola3, M.-I. Richard1,2, A. Malachias2, G. Renaud1, F. Uhlík3, F. Montalenti3, G. Chen4, L. Miglio3, F. Schäffler4, and G. Bauer4

  • 1CEA Grenoble, INAC/SP2M, 17 rue des martyrs, F-38054 Grenoble, France
  • 2ESRF, Grenoble 6 rue J. Horowitz, F-38043 Grenoble, France
  • 3L-NESS and Materials Science Department, University of Milano-Bicocca, Via R. Cozzi 53, I-20125 Milano, Italy
  • 4Johannes Kepler Universität Linz, A-4040 Linz, Austria

  • *schulli@esrf.fr

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Vol. 102, Iss. 2 — 16 January 2009

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