Abstract
Using scanning tunneling microscopy, we determine that the one-dimensional diffusion of Si adatoms along the surface reconstruction occurs by a defect-mediated mechanism. Distinctive diffusion statistics, especially correlations between sequential adatom displacements, imply that the displacements are triggered by an interaction with a defect that is localized to the adatom. The defect is intrinsic and thermally activated. The measured diffusion statistics are modeled accurately by a Monte Carlo simulation. The measured adatom diffusion activation barrier is .
- Received 16 July 2008
DOI:https://doi.org/10.1103/PhysRevLett.101.266101
©2008 American Physical Society