One-Dimensional Defect-Mediated Diffusion of Si Adatoms on the Si(111)(5×2)Au Surface

E. Bussmann, S. Bockenhauer, F. J. Himpsel, and B. S. Swartzentruber
Phys. Rev. Lett. 101, 266101 – Published 22 December 2008

Abstract

Using scanning tunneling microscopy, we determine that the one-dimensional diffusion of Si adatoms along the Si(111)(5×2)Au surface reconstruction occurs by a defect-mediated mechanism. Distinctive diffusion statistics, especially correlations between sequential adatom displacements, imply that the displacements are triggered by an interaction with a defect that is localized to the adatom. The defect is intrinsic and thermally activated. The measured diffusion statistics are modeled accurately by a Monte Carlo simulation. The measured adatom diffusion activation barrier is 1.24±0.08eV.

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  • Received 16 July 2008

DOI:https://doi.org/10.1103/PhysRevLett.101.266101

©2008 American Physical Society

Authors & Affiliations

E. Bussmann1, S. Bockenhauer2, F. J. Himpsel2, and B. S. Swartzentruber1

  • 1Sandia National Laboratories, Albuquerque, New Mexico 87185, USA
  • 2Department of Physics, University of Wisconsin-Madison, Madison, Wisconsin 53706, USA

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Vol. 101, Iss. 26 — 31 December 2008

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