Temperature dependence of formation of a supported phospholipid bilayer from vesicles on SiO2

E. Reimhult, F. Höök, and B. Kasemo
Phys. Rev. E 66, 051905 – Published 13 November 2002
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Abstract

Adsorption of egg-phosphatidylcholine vesicles and bilayer formation on a SiO2 surface was investigated in the temperature range 278–303 K using the quartz crystal microbalance-dissipation technique. The critical coverage for the vesiclebilayer transition is found to decrease with increasing temperature. The temperature dependence of the time-scale characterizing this transition can be represented in the Arrhenius form. Higher temperatures produce a bilayer with fewer trapped, nonruptured vesicles.

  • Received 9 April 2002

DOI:https://doi.org/10.1103/PhysRevE.66.051905

©2002 American Physical Society

Authors & Affiliations

E. Reimhult*, F. Höök, and B. Kasemo

  • Department of Applied Physics, Chalmers University of Technology, Göteborg S-412 96, Sweden

  • *Corresponding author.

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Vol. 66, Iss. 5 — November 2002

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