Cell dynamics simulations of shear-induced alignment and defect annihilation in stripe patterns formed by block copolymers

S. R. Ren, I. W. Hamley, P. I. C. Teixeira, and P. D. Olmsted
Phys. Rev. E 63, 041503 – Published 26 March 2001
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Abstract

The effect of large amplitude oscillatory shear on two-dimensional stripe patterns formed by block copolymers was investigated using cell dynamics simulations. A global orientational order parameter S and a correlation function for stripe normals G(rr) were used to characterize the degree of stripe orientation under shear. The kinetics of stripe alignment, quantified by S, at various shear and quench conditions were studied as a function of strain amplitude, shear frequency, and temperature. The mechanisms of shear alignment and defect annihilation were investigated. A critical shear condition for complete alignment of stripes along the shear direction was also identified.

  • Received 27 June 2000

DOI:https://doi.org/10.1103/PhysRevE.63.041503

©2001 American Physical Society

Authors & Affiliations

S. R. Ren and I. W. Hamley*

  • School of Chemistry, University of Leeds, Leeds LS2 9JT, United Kingdom

P. I. C. Teixeira and P. D. Olmsted

  • Department of Physics and Astronomy, University of Leeds, Leeds LS2 9JT, United Kingdom

  • *Author to whom correspondence should be addressed.
  • Present address: Departamento de Engenharia de Materiais, Instituto Superior Tecnico, Avenida Rovisco Pais, P-1049-001 Lisbon, Portugal.

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Vol. 63, Iss. 4 — April 2001

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