Abstract
We report on the experimental and theoretical investigation of the relaxation in Ge-rich SiGe/Ge/Si heterostructures. The experimental x-ray diffraction data are interpreted with the help of a model including both edge and 60 misfit dislocations in the calculated x-ray scattering intensity. Our results show that highly positionally correlated edge dislocations dominate in the relaxation of the compressive strain at the Ge/Si interface, while a smaller tensile strain at the SiGe/Ge interfaces released by uncorrelated/little correlated 60 dislocations.
- Received 27 April 2012
DOI:https://doi.org/10.1103/PhysRevB.85.245311
©2012 American Physical Society