X-ray diffraction study of plastic relaxation in Ge-rich SiGe virtual substrates

Viktor S. Kopp, Vladimir M. Kaganer, Giovanni Capellini, Monica De Seta, and Peter Zaumseil
Phys. Rev. B 85, 245311 – Published 19 June 2012

Abstract

We report on the experimental and theoretical investigation of the relaxation in Ge-rich SiGe/Ge/Si heterostructures. The experimental x-ray diffraction data are interpreted with the help of a model including both edge and 60 misfit dislocations in the calculated x-ray scattering intensity. Our results show that highly positionally correlated edge dislocations dominate in the relaxation of the compressive strain at the Ge/Si interface, while a smaller tensile strain at the SiGe/Ge interfaces released by uncorrelated/little correlated 60 dislocations.

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  • Received 27 April 2012

DOI:https://doi.org/10.1103/PhysRevB.85.245311

©2012 American Physical Society

Authors & Affiliations

Viktor S. Kopp* and Vladimir M. Kaganer

  • Paul Drude Institut für Festkörperelecktronik, Hausvogteiplatz 5-7, D-10117 Berlin, Germany

Giovanni Capellini and Monica De Seta

  • Dipartimento di Fisica “E. Amaldi,” Università di Roma Tre, via Vasca Navale 84, 00146 Rome, Italy

Peter Zaumseil

  • IHP, Im Technologiepark 25, 15236 Frankfurt (Oder), Germany

  • *victor.kopp@pdi-berlin.de

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Issue

Vol. 85, Iss. 24 — 15 June 2012

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