Polarization-dependent absorption in Ge/SiGe multiple quantum wells: Theory and experiment

Michele Virgilio, Matteo Bonfanti, Daniel Chrastina, Antonia Neels, Giovanni Isella, Emanuele Grilli, Mario Guzzi, Giuseppe Grosso, Hans Sigg, and Hans von Känel
Phys. Rev. B 79, 075323 – Published 25 February 2009

Abstract

Polarization resolved absorption spectra of a strain-compensated Ge multiple quantum well (MQW) structure with Ge-rich SiGe barriers have been calculated with an sp3d5s tight-binding model and measured for light propagating perpendicular to the growth direction. The MQW was grown by low-energy plasma-enhanced chemical vapor deposition and consists of 50 Ge quantum wells deposited onto a thick graded Si1xGex buffer layer. The MQW was structurally characterized by high-resolution x-ray diffraction. The measured absorption spectra show clear quantum confined excitonic transitions related to the GeΓ point band gap, and strong dependence on the incident light polarization, as expected from selection rules for type I direct gap quantum confined systems. A good agreement between theoretically predicted spectra and experimental data is found, demonstrating light and heavy hole polarization-dependent selection rules in Ge MQWs.

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  • Received 14 November 2008

DOI:https://doi.org/10.1103/PhysRevB.79.075323

©2009 American Physical Society

Authors & Affiliations

Michele Virgilio1, Matteo Bonfanti2,*, Daniel Chrastina3, Antonia Neels4, Giovanni Isella3, Emanuele Grilli2, Mario Guzzi2, Giuseppe Grosso1, Hans Sigg5, and Hans von Känel3

  • 1Dipartimento di Fisica “E. Fermi” and CNR-NEST-INFM, Università di Pisa, Largo Pontecorvo 3, I-56127 Pisa, Italy
  • 2Dipartimento di Scienza dei Materiali and L-NESS, Università degli Studi di Milano-Bicocca, Via Cozzi 53, I-20125 Milano, Italy
  • 3Dipartimento di Fisica and L-NESS, Politecnico di Milano, Polo di Como, via Anzani 42, I-22100 Como, Italy
  • 4Institute of Microtechnology, University of Neuchâtel, Rue Jaquet-Droz 1, CH-2002 Neuchâtel, Switzerland
  • 5Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, CH-5232 Villigen-PSI, Switzerland

  • *matteo.bonfanti@mater.unimib.it

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Issue

Vol. 79, Iss. 7 — 15 February 2009

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