Influence of substrate surface polarity on homoepitaxial growth of ZnO layers by chemical vapor deposition

Markus R. Wagner, Til P. Bartel, Ronny Kirste, Axel Hoffmann, Joachim Sann, Stefan Lautenschläger, Bruno K. Meyer, and C. Kisielowski
Phys. Rev. B 79, 035307 – Published 9 January 2009

Abstract

The influence of the substrate polarity (Zn polar or O polar) on the structural and optical properties of homoepitaxial ZnO epilayers grown by chemical vapor deposition is investigated. The polarity of the epilayer is controlled by the substrate polarity as shown by high-resolution transmission electron microscopy (TEM) imaging. Changes in stoichiometry in the epilayer are studied by quantitative TEM analysis. A small compressive strain of ϵcc=3×104 is observed in both epilayers and x-ray diffraction measurements indicate a superior structural quality of the epilayers compared to the substrate. Cross-sectional Raman spectroscopy also demonstrates the superior quality of the epilayers, although high strain is present within the substrates. The phonon deformation-potential parameters of the strain sensitive E2(high) Raman mode are determined to a=730cm1 and b=1000cm1. Differences in the excitonic luminescence including the appearance of different emission lines and an increased full width at half maximum in O-face epilayers are observed. It is suggested that the impurity diffusion from the substrate to the layer is affected by the substrate surface polarity with lower impurity concentrations in the Zn-polar film compared to the O-polar epilayer.

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  • Received 6 June 2008

DOI:https://doi.org/10.1103/PhysRevB.79.035307

©2009 American Physical Society

Authors & Affiliations

Markus R. Wagner*, Til P. Bartel, Ronny Kirste, and Axel Hoffmann

  • Institute of Solid State Physics, TU Berlin, Hardenbergstrasse 36, 10623 Berlin, Germany

Joachim Sann, Stefan Lautenschläger, and Bruno K. Meyer

  • I. Physics Institute, Justus Liebig University, Heinrich-Buff-Ring 16, 35592 Giessen, Germany

C. Kisielowski

  • National Center for Electron Microscopy, Materials Sciences Division, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720, USA

  • *markus.wagner@tu-berlin.de

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Vol. 79, Iss. 3 — 15 January 2009

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