Energy transfer in Er-doped SiO2 sensitized with Si nanocrystals

I. Izeddin, D. Timmerman, T. Gregorkiewicz, A. S. Moskalenko, A. A. Prokofiev, I. N. Yassievich, and M. Fujii
Phys. Rev. B 78, 035327 – Published 23 July 2008

Abstract

We present a high-resolution photoluminescence study of Er-doped SiO2 sensitized with Si nanocrystals (Si NCs). Emission bands originating from recombination of excitons confined in Si NCs, internal transitions within the 4f-electron core of Er3+ ions, and a band centered at λ1200nm have been identified. Their kinetics were investigated in detail. Based on these measurements, we present a comprehensive model for energy-transfer mechanisms responsible for light generation in this system. A unique picture of energy flow between the two subsystems was developed, yielding truly microscopic information on the sensitization effect and its limitations. In particular, we show that most of the Er3+ ions available in the system are participating in the energy exchange. The long-standing problem of apparent loss of optical activity in the majority of Er dopants upon sensitization with Si NCs is clarified and assigned to the appearance of a very efficient energy exchange mechanism between Si NCs and Er3+ ions. Application potential of SiO2:Er, sensitized by Si NCs, was discussed in view of the newly acquired microscopic insight.

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  • Received 18 February 2008

DOI:https://doi.org/10.1103/PhysRevB.78.035327

©2008 American Physical Society

Authors & Affiliations

I. Izeddin*, D. Timmerman, and T. Gregorkiewicz

  • Van der Waals-Zeeman Institute, University of Amsterdam, Valckenierstraat 65, NL-1018XE Amsterdam, The Netherlands

A. S. Moskalenko

  • Institut für Physik, Martin-Luther-Universität Halle-Wittenberg, Nanotechnikum-Weinberg, Heinrich-Damerow-St. 4, 06120 Halle, Germany

A. A. Prokofiev and I. N. Yassievich

  • Ioffe Physico-Technical Institute, Russian Academy of Sciences, Politekhnicheskaya 26, 194021 St. Petersburg, Russia

M. Fujii

  • Department of Electrical and Electronic Engineering, Faculty of Engineering, Kobe University, Rokkodai, Nada, Kobe 657-8501, Japan

  • *Currently at: Laboratoire Kastler Brossel, Départements de Physique et de Biologie, Ecole Normale Supérieure, 46 rue d'Ulm, Paris, France.

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Vol. 78, Iss. 3 — 15 July 2008

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