Effect of hydrogen passivation on luminescence-center-mediated Er excitation in Si-rich SiO2 with and without Si nanocrystals

Oleksandr Savchyn, Pieter G. Kik, Ravi M. Todi, and Kevin R. Coffey
Phys. Rev. B 77, 205438 – Published 30 May 2008

Abstract

The influence of hydrogen passivation on luminescence-center-mediated excitation of Er3+ in Er-doped Si-rich SiO2 films with significantly different microstructures is studied. Photoluminescence measurements are presented for samples containing no detectable silicon nanocrystals (annealed at 600°C) and for samples containing silicon nanocrystals (annealed at 1100°C) as a function of hydrogen passivation temperature. Passivation is found to have little effect on the Er3+ photoluminescence intensity at 1535 nm in the samples that do not contain nanocrystals. In contrast, a pronounced increase in the Er3+ photoluminescence intensity is observed in the samples containing Si nanocrystals, which is accompanied by a similar increase in the nanocrystal photoluminescence intensity and a gradual increase in the Si nanocrystal emission lifetime. This observation is attributed to two interrelated effects, namely, (a) an increase in the density of fully passivated optically active nanocrystals due to the passivation-induced removal of silicon dangling bonds and (b) a concurrent reduction in nonradiative Er3+ relaxation from levels above the I413/2 level due to a direct interaction of excited Er3+ ions with silicon dangling bonds. In addition, the observed counterintuitive gradual increase in the nanocrystal photoluminescence decay time upon passivation is successfully explained taking into account a passivation-induced change in the concentration of optically active nanocrystals with different sizes and the inhomogeneous nature of the nanocrystal-related emission band. It is shown that the combination of luminescence-center-mediated Er3+ excitation and silicon-dangling-bond-induced Er3+ de-excitation can explain at least 14 experimental observations reported by independent authors.

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  • Received 16 January 2008

DOI:https://doi.org/10.1103/PhysRevB.77.205438

©2008 American Physical Society

Authors & Affiliations

Oleksandr Savchyn* and Pieter G. Kik

  • CREOL, The College of Optics and Photonics, University of Central Florida, 4000 Central Florida Boulevard, Orlando, Florida 32816, USA

Ravi M. Todi and Kevin R. Coffey†,‡,§

  • Advanced Materials Processing and Analysis Center (AMPAC), University of Central Florida, 4000 Central Florida Boulevard, Orlando, Florida 32816, USA

  • *Corresponding author; osavchyn@mail.ucf.edu
  • Also at Physics Department, University of Central Florida, 4000 Central Florida Blvd., Orlando, FL 32816, USA.
  • Also at School of Electrical Engineering and Computer Science, University of Central Florida, 4000 Central Florida Blvd., Orlando, FL 32816, USA.
  • §Also at Department of Mechanical, Materials and Aerospace Engineering, University of Central Florida, 4000 Central Florida Blvd., Orlando, FL 32816, USA.

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Issue

Vol. 77, Iss. 20 — 15 May 2008

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