Scaling behavior of the surface roughness of platinum films grown by oblique angle deposition

A. Dolatshahi-Pirouz, M. B. Hovgaard, K. Rechendorff, J. Chevallier, M. Foss, and F. Besenbacher
Phys. Rev. B 77, 115427 – Published 17 March 2008

Abstract

Thin platinum films with well-controlled rough surface morphologies are grown by e-gun evaporation at an oblique angle of incidence between the deposition flux and the substrate normal. Atomic force microscopy is used to determine the root-mean-square value w of the surface roughness on the respective surfaces. From the scaling behavior of w, we find that while the roughness exponent α remains nearly unchanged at about 0.90, the growth exponent β changes from 0.49±0.04 to 0.26±0.01 as the deposition angle approaches grazing incidence. The values of the growth exponent β indicate that the film growth is influenced by both surface diffusion and shadowing effects, while the observed change from 0.49 to 0.26 can be attributed to differences in the relative importance of diffusion and shadowing with the deposition angle.

  • Figure
  • Figure
  • Figure
  • Received 21 June 2007

DOI:https://doi.org/10.1103/PhysRevB.77.115427

©2008 American Physical Society

Authors & Affiliations

A. Dolatshahi-Pirouz, M. B. Hovgaard, K. Rechendorff, J. Chevallier, M. Foss, and F. Besenbacher

  • Interdisciplinary Nanoscience Center (iNANO) and Department of Physics and Astronomy, University of Aarhus, DK-8000 Aarhus C, Denmark

Article Text (Subscription Required)

Click to Expand

References (Subscription Required)

Click to Expand
Issue

Vol. 77, Iss. 11 — 15 March 2008

Reuse & Permissions
Access Options

Authorization Required


×
×

Images

×

Sign up to receive regular email alerts from Physical Review B

Log In

Cancel
×

Search


Article Lookup

Paste a citation or DOI

Enter a citation
×