Transition-pathway models of atomic diffusion on fcc metal surfaces. II. Stepped surfaces

Sung Youb Kim, In-Ho Lee, and Sukky Jun
Phys. Rev. B 76, 245408 – Published 10 December 2007

Abstract

Action-derived molecular dynamics was demonstrated in the companion paper (Paper I) to be effective for the analysis of atomic surface diffusion. The method is here applied to the search of minimum-energy paths and the calculation of activation energy barriers in more complex single-adatom diffusion processes on fcc metal surfaces containing steps. Diverse diffusion routes are investigated along and across one- or two-layer steps on different surface orientations. Fundamental diffusion mechanisms near the step corners are also studied. Results are analyzed in relation to the island growth mechanism, which is of importance to surface nanoengineering.

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  • Received 7 June 2007

DOI:https://doi.org/10.1103/PhysRevB.76.245408

©2007 American Physical Society

Authors & Affiliations

Sung Youb Kim

  • Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Korea

In-Ho Lee

  • Korea Research Institute of Standards and Science, Daejeon 305-600, Korea

Sukky Jun*

  • Department of Mechanical Engineering, University of Wyoming, Laramie, Wyoming 82071, USA

  • *Author to whom correspondence should be addressed; sjun@uwyo.edu

See Also

Transition-pathway models of atomic diffusion on fcc metal surfaces. I. Flat surfaces

Sung Youb Kim, In-Ho Lee, and Sukky Jun
Phys. Rev. B 76, 245407 (2007)

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Vol. 76, Iss. 24 — 15 December 2007

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