Transition-pathway models of atomic diffusion on fcc metal surfaces. I. Flat surfaces

Sung Youb Kim, In-Ho Lee, and Sukky Jun
Phys. Rev. B 76, 245407 – Published 10 December 2007

Abstract

Numerical calculation of minimum-energy paths and activation energy barriers for various atomic diffusion processes on fcc metal surfaces are presented. The computational method employed is the action-derived molecular dynamics that searches the approximate Newtonian trajectory on potential-energy surfaces. The minimization of a modified action, which facilitates the conservation of total energy and the control of kinetic energy, enables us to find efficiently the minimum-energy paths of complex microscopic processes. Diverse diffusion mechanisms on flat fcc substrates are investigated in this first part of the series. More complicated systems including surface steps are simulated in paper II.

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  • Received 7 June 2007

DOI:https://doi.org/10.1103/PhysRevB.76.245407

©2007 American Physical Society

Authors & Affiliations

Sung Youb Kim

  • Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, Daejeon 305-701, Korea

In-Ho Lee

  • Korea Research Institute of Standards and Science, Daejeon 305-600, Korea

Sukky Jun*

  • Department of Mechanical Engineering, University of Wyoming, Laramie, Wyoming 82071, USA

  • *Author to whom correspondence should be addressed; sjun@uwyo.edu

See Also

Transition-pathway models of atomic diffusion on fcc metal surfaces. II. Stepped surfaces

Sung Youb Kim, In-Ho Lee, and Sukky Jun
Phys. Rev. B 76, 245408 (2007)

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Vol. 76, Iss. 24 — 15 December 2007

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