Photoemission study of TiO2VO2 interfaces

K. Maekawa, M. Takizawa, H. Wadati, T. Yoshida, A. Fujimori, H. Kumigashira, M. Oshima, Y. Muraoka, Y. Nagao, and Z. Hiroi
Phys. Rev. B 76, 115121 – Published 20 September 2007

Abstract

We have measured photoemission spectra of two kinds of TiO2-capped VO2 thin films, namely, that with a rutile-type TiO2 capping layer (rTiO2VO2) and that with an amorphous TiO2 capping layer (aTiO2VO2). Below the metal-insulator transition temperature of the VO2 thin films, 300K, TiO2 and VO2 form an interface between a band insulator with the d0 electronic configuration and a Mott (or Mott-Peierls) insulator with the d1 electronic configuration. Metallic states were, however, not observed at the interfaces, in contrast to the interfaces between the d0 band insulator SrTiO3 and the d1 Mott insulator LaTiO3. We discuss possible origins of the difference between TiO2VO2 and SrTiO3LaTiO3, and suggest the importance of the polarity discontinuity in the latter interface. The stronger incoherent part was observed in rTiO2VO2 than in aTiO2VO2, suggesting Ti-V atomic diffusion due to the higher deposition temperature for rTiO2VO2.

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  • Received 17 November 2006

DOI:https://doi.org/10.1103/PhysRevB.76.115121

©2007 American Physical Society

Authors & Affiliations

K. Maekawa, M. Takizawa, H. Wadati, T. Yoshida, and A. Fujimori

  • Department of Physics, University of Tokyo, Bunkyo-ku, Tokyo 113-0033, Japan

H. Kumigashira and M. Oshima

  • Department of Applied Chemistry, University of Tokyo, Bunkyo-ku, Tokyo 113-8656, Japan

Y. Muraoka*, Y. Nagao, and Z. Hiroi

  • Institute for Solid State Physics, University of Tokyo, 5-1-5 Kashiwanoha, Kashiwashi, Chiba 277-8581, Japan

  • *Present address: Research Laboratory for Surface Science, Okayama University, 1-1, Naka 3, Tsushima, Okayama 700-8530, Japan

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Issue

Vol. 76, Iss. 11 — 15 September 2007

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