Atomic-scale modeling of next-layer nucleation and step flow at the Ge(105) rebonded-step surface

S. Cereda and F. Montalenti
Phys. Rev. B 75, 195321 – Published 17 May 2007

Abstract

Based on ab initio calculations, we propose an atomic-scale path leading to the growth of a new layer on the rebonded-step reconstructed Ge(105) surface. We show that the nucleation of (001)-like dimers triggers the formation of low-energy adtrimers within the surface unit cell. The presence of adjacent trimers and the arrival of a further adatom initiate a fast kinetic process, allowing the perfect rebonded-step structure to be rebuilt. After repeating some of the calculations under compressive-strain conditions, we discuss position-dependent nucleation in (105) Ge pyramid on Si(001), finding solid theoretical justification for the experimentally observed preferential nucleation at the top of Ge islands, followed by fast step flow.

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  • Received 26 January 2007

DOI:https://doi.org/10.1103/PhysRevB.75.195321

©2007 American Physical Society

Authors & Affiliations

S. Cereda and F. Montalenti*

  • L-NESS, Dipartimento di Scienza dei Materiali della Università degli Studi di Milano-Bicocca, Via Cozzi 53, I-20125 Milano, Italy

  • *Electronic address: francesco.montalenti@unimib.it

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Issue

Vol. 75, Iss. 19 — 15 May 2007

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