Strongly bias-dependent spin injection from Fe into n-type GaAs

M. C. Hickey, S. N. Holmes, T. Meng, I. Farrer, G. A. C. Jones, D. A. Ritchie, and M. Pepper
Phys. Rev. B 75, 193204 – Published 25 May 2007

Abstract

We report electrical spin injection into an n-doped GaAs (Nd=1×1018cm3) region from an Fe thin film grown by molecular beam epitaxy. The spins are injected through an nAl0.1Ga0.9As Schottky barrier on a spin light emitting diode. Spin injection is detected optically via carrier recombination in the layer immediately adjacent to the Schottky barrier, allowing the spin transport to be studied through this important region of interest. A pronounced dependence of injected spin polarization upon applied bias voltage reveals that efficient spin injection occurs across a range of 1V, dropping off sharply to zero at all temperatures. At bias voltages higher than that at which the maximum spin injection occurs, the Schottky barrier resistance is lowered, accompanied by hot electron spin transport in the semiconductor.

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  • Received 18 January 2007

DOI:https://doi.org/10.1103/PhysRevB.75.193204

©2007 American Physical Society

Authors & Affiliations

M. C. Hickey*, S. N. Holmes, T. Meng, I. Farrer, G. A. C. Jones, D. A. Ritchie, and M. Pepper

  • Cavendish Laboratory, University of Cambridge, J.J. Thomson Avenue, Cambridge, CB3 OHE, United Kingdom

  • *Present address: Condensed Matter, School of Physics and Astronomy, E. C. Stoner Laboratory, University of Leeds, Leeds, LS2 9JT, United Kingdom. Email address: m.c.hickey@leeds.ac.uk
  • Also at Toshiba Research Europe Limited, Cambridge Research Laboratory, 260 Cambridge Science Park, Cambridge, CB4 0WE, United Kingdom.

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Issue

Vol. 75, Iss. 19 — 15 May 2007

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