Amorphization in iron nitride thin films prepared by reactive ion-beam sputtering

Ranu Dubey, Ajay Gupta, and J. C. Pivin
Phys. Rev. B 74, 214110 – Published 14 December 2006

Abstract

Reactive ion-beam sputtering has been used to prepare iron nitride over a wide composition range. It is found that the samples deposited at room temperature exhibit amorphous phase in the composition range from 12at.% nitrogen to 23at.% nitrogen. For samples deposited at liquid nitrogen temperature the system is amorphous up to 35at.% nitrogen. Amorphization can be understood in terms of a frustration in the system due to a competition between α and ε phases. Kinetic constraints are also found to play a role in the amorphization process. Mössbauer measurements suggest that the local order in the amorphous phase consists of a mixture of αFe–like and εFe3N–like short-range orders. On the iron rich side the amorphous phase exhibits two-step crystallization, with a primary αFe phase precipitating out in the first step. Around 22at.% nitrogen the system exhibits a single step isomorphous transformation to ε phase. Thus, amorphous iron nitride phases exhibit behavior very similar to the conventional transition metal-metalloid amorphous alloys. In the remaining composition range nanocrystalline phases are formed. The amorphous magnetic iron nitride phases are expected to have distinct advantages over their crystalline counterparts in terms of soft magnetic applications.

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  • Received 21 May 2006

DOI:https://doi.org/10.1103/PhysRevB.74.214110

©2006 American Physical Society

Authors & Affiliations

Ranu Dubey1, Ajay Gupta1,*, and J. C. Pivin2

  • 1UGC-DAE Consortium for Scientific Research, University Campus, Khandwa Road, Indore 452017, India
  • 2CSNSM-IN2P3, Bätiment 108, 91405 Orsay Campus, France

  • *Author to whom correspondence should be addressed. Email address: agupta@csr.ernet.in

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Issue

Vol. 74, Iss. 21 — 1 December 2006

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