C60 on strain-relief patterns of AgPt(111): Film orientation governed by template superstructure

K. Aït-Mansour, P. Ruffieux, W. Xiao, P. Gröning, R. Fasel, and O. Gröning
Phys. Rev. B 74, 195418 – Published 14 November 2006

Abstract

The adsorption, growth and overlayer formation of C60 fullerene molecules on strain-relief patterns induced by 2 monolayers of Ag on Pt(111) (Ag(2ML)/Pt(111)) is investigated by means of scanning tunneling microscopy. The Ag(2ML)/Pt(111) template surface consists of periodic crossing dislocations separating face-centered cubic (fcc) and hexagonal close-packed (hcp) stacking domains. At room temperature, C60 molecules are found to be sufficiently mobile on the template surface to cross the dislocations and to self-assemble into large hexagonally close-packed two-dimensional islands. The nucleation and growth of the C60 islands takes place not only at the step-edges, but also in the middle of terraces. The islands cover as well fcc as hcp domains of the template, in a near commensurate fashion with respect to the Ag(2ML)/Pt(111) superstructure. This commensurability manifests itself by a transfer of the strain relief superstructure into the molecular film via a “lock to register” mechanism. The Ag(2ML)/Pt(111) superstructure acts on the molecular film by orientating the C60 close-packed rows along the Ag11¯0 direction. This is different from the usual orientation of a C60 film on a standard and unreconstructed Ag(111) substrate, namely it is rotated by 30°. The C60 “lock to register” phenomenon can find interpretation in a strong substrate-molecule interaction, which can result in a significant compression of the C60 lattice. Here, a special role is played by Ag(2ML)/Pt(111) small hcp stacking domains enclosed by strong discommensuration lines, foremost responsible for the “lock to register” mechanism.

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  • Received 8 June 2006

DOI:https://doi.org/10.1103/PhysRevB.74.195418

©2006 American Physical Society

Authors & Affiliations

K. Aït-Mansour*, P. Ruffieux, W. Xiao, P. Gröning, R. Fasel, and O. Gröning

  • Empa, Swiss Federal Laboratories for Materials Testing and Research, nanotech@surfaces Laboratory, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland

  • *Corresponding author: Kamel Aït-Mansour, Empa, Swiss Federal Laboratories for Materials Testing and Research, nanotech@surfaces Laboratory, Feuerwerkerstrasse 39, CH-3602 Thun, Switzerland; E-mail: Kamel.Ait-Mansour@empa.ch; Tel: +41 (0)33 228 29 32; Fax: +41 (0)33 228 44 90

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Issue

Vol. 74, Iss. 19 — 15 November 2006

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