Atomic dynamics of In nanoclusters on Si(100)

A. A. Saranin, A. V. Zotov, I. A. Kuyanov, M. Kishida, Y. Murata, S. Honda, M. Katayama, K. Oura, C. M. Wei, and Y. L. Wang
Phys. Rev. B 74, 125304 – Published 7 September 2006

Abstract

Using scanning-tunneling microscopy and first-principles total-energy calculations, we have considered the structural properties of the so-called doped clusters formed by depositing additional 0.05 monolayer of In onto the 4×3-periodicity magic-cluster array in the InSi(100) system. Low-temperature STM observations have revealed that most of the doped clusters have an asymmetric shape. According to the total-energy calculations, these clusters have plausibly Si6In8 composition. In such a cluster, one of the In atoms is mobile and can hop between four equivalent sites within a cluster. The hopping between sites, located in the different 2a×3a halves of the cluster, is characterized by the barrier of about 0.7eV, and this hopping becomes frozen at 55K. In contrast, the hopping between the neighboring sites within the same cluster half persists up to very low temperatures, as the barrier height here is an order of magnitude lower. Due to the above structural properties, the doped asymmetric Si6In8 cluster can be treated as a promising switch, logic gate, or memory cell of the atomic-scale size.

    • Received 19 May 2006

    DOI:https://doi.org/10.1103/PhysRevB.74.125304

    ©2006 American Physical Society

    Authors & Affiliations

    A. A. Saranin1,2, A. V. Zotov1,3, I. A. Kuyanov1,2, M. Kishida4, Y. Murata4, S. Honda4, M. Katayama4, K. Oura5, C. M. Wei6, and Y. L. Wang6

    • 1Institute of Automation and Control Processes, 690041 Vladivostok, Russia
    • 2Faculty of Physics and Engineering, Far Eastern State University, 690000 Vladivostok, Russia
    • 3Department of Electronics, Vladivostok State University of Economics and Service, 690600 Vladivostok, Russia
    • 4Department of Electronic Engineering, Faculty of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
    • 5Research Center for Ultra-High Voltage Electron Microscopy, Osaka University, Ibaraki, Osaka 567-0047, Japan
    • 6Institute of Atomic and Molecular Sciences, Academia Sinica, P.O. Box 23-166, Taipei, Taiwan, Republic of China

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    Issue

    Vol. 74, Iss. 12 — 15 September 2006

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