In situ observation of the formation, diffusion, and reactions of hydrogenous species in F2-laser-irradiated SiO2 glass using a pump-and-probe technique

Koichi Kajihara, Linards Skuja, Masahiro Hirano, and Hideo Hosono
Phys. Rev. B 74, 094202 – Published 25 September 2006

Abstract

We quantitatively studied the formation, diffusion, and reactions of mobile interstitial hydrogen atoms (H0) and molecules (H2) in F2-laser-irradiated silica (SiO2) glass between 10 and 330K. Two key techniques were used: single-pulse F2 laser photolysis of silanol (SiOH) groups to selectively create pairs of H0 and oxygen dangling bonds (nonbridging oxygen hole centers, NBOHC), and in situ photoluminescence measurements of NBOHCs to monitor their reactions with H0 and H2 as a function of time and temperature. A smaller quantum yield of the photolysis of the SiOH bond (0.15±0.05) compared with values reported for gas molecules containing OH bonds (1) suggests that the separation of photogenerated H0 from NBOHC is hindered by the cage effect of the SiO2 glass network. Distribution functions for the diffusion coefficients of H0 and H2 in the structurally disordered SiO2 glass were evaluated by numerical analysis of the concentration changes of NBOHC based on diffusion-limited reaction theory. The average diffusion coefficient of H2 obtained by integrating the distribution agrees well with the values measured by the permeation of H2 through SiO2 glass plates. In contrast, the average diffusion coefficient of H0 significantly decreases with time because the distribution of the diffusion coefficient of H0 is broad and H0s with greater mobility disappear at a faster rate. We suggest that the efficient conversion of H0 into H2 in SiO2 glass is due to dissipation of the excess energy of the reaction intermediate via inelastic collisions with the glass network. The fraction of H0 that forms H2 is determined by the ratio of the capture radii of H0 and NBOHC, and it is independent of the diffusion coefficient and the initial concentration of H0.

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  • Received 18 July 2006

DOI:https://doi.org/10.1103/PhysRevB.74.094202

©2006 American Physical Society

Authors & Affiliations

Koichi Kajihara1,*, Linards Skuja1,2, Masahiro Hirano1, and Hideo Hosono1,3

  • 1Transparent Electro-Active Materials Project, ERATO-SORST, Japan Science and Technology Agency, in Frontier Collaborative Research Center, Mail Box S2-13, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan
  • 2Institute of Solid State Physics, University of Latvia, Kengaraga iela 8, LV1063 Riga, Latvia
  • 3Materials and Structures Laboratory & Frontier Collaborative Research Center, Tokyo Institute of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

  • *Corresponding author. Email address: kaji2@lucid.msl.titech.ac.jp

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Issue

Vol. 74, Iss. 9 — 1 September 2006

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