Radiation damage in silicon exposed to high-energy protons

Gordon Davies, Shusaku Hayama, Leonid Murin, Reinhard Krause-Rehberg, Vladimir Bondarenko, Asmita Sengupta, Cinzia Davia, and Anna Karpenko
Phys. Rev. B 73, 165202 – Published 3 April 2006

Abstract

Photoluminescence, infrared absorption, positron annihilation, and deep-level transient spectroscopy (DLTS) have been used to investigate the radiation damage produced by 24GeVc protons in crystalline silicon. The irradiation doses and the concentrations of carbon and oxygen in the samples have been chosen to monitor the mobility of the damage products. Single vacancies (and self-interstitials) are introduced at the rate of 1cm1, and divacancies at 0.5cm1. Stable di-interstitials are formed when two self-interstitials are displaced in one damage event, and they are mobile at room temperature. In the initial stages of annealing the evolution of the point defects can be understood mainly in terms of trapping at the impurities. However, the positron signal shows that about two orders of magnitude more vacancies are produced by the protons than are detected in the point defects. Damage clusters exist, and are largely removed by annealing at 700to800K, when there is an associated loss of broad band emission between 850 and 1000meV. The well-known W center is generated by restructuring within clusters, with a range of activation energies of about 1.3to1.6eV, reflecting the disordered nature of the clusters. Comparison of the formation of the X centers in oxygenated and oxygen-lean samples suggests that the J defect may be interstitial related rather than vacancy related. To a large extent, the damage and annealing behavior may be factorized into point defects (monitored by sharp-line optical spectra and DLTS) and cluster defects (monitored by positron annihilation and broadband luminescence). Taking this view to the limit, the generation rates for the point defects are as predicted by simply taking the damage generated by the Coulomb interaction of the protons and Si nuclei.

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  • Received 31 January 2006

DOI:https://doi.org/10.1103/PhysRevB.73.165202

©2006 American Physical Society

Authors & Affiliations

Gordon Davies*

  • Department of Physics, King’s College London, Strand, London WC2R 2LS, United Kingdom

Shusaku Hayama

  • Department of Physics, King’s College London, Strand, London WC2R 2LS, United Kingdom and CCLRC Daresbury Laboratory, Daresbury, Warrington, Cheshire, WA4 4AD, United Kingdom

Leonid Murin

  • Joint Institute of Solid State and Semiconductor Physics, National Academy of Sciences of Belarus, 220072 Minsk, Belarus

Reinhard Krause-Rehberg and Vladimir Bondarenko

  • Department of Physics, Martin Luther University, 06108 Halle, Germany

Asmita Sengupta

  • Department of Physics, Visva-Bharati Central University, Santiniketan-731235, India

Cinzia Davia and Anna Karpenko

  • Department of Electronic Engineering, Brunel University, Uxbridge UB8 3PH, United Kingdom

  • *Electronic address: gordon.davies@kcl.ac.uk

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Vol. 73, Iss. 16 — 15 April 2006

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