Abstract
Multiple-scattering extended x-ray absorption fine structure (MS-EXAFS) has been used to investigate the local structures around Ge atoms in self-assembled quantum dots (QDs) grown on Si(001) substrate. The MS effect of Ge QDs is dominated by the scattering path , which contributes a signal destructively interfering with that of the second shell single-scattering path (SS2). MS-EXAFS analysis reveals that the degree of intermixing for QDs strongly depends on the temperature at which the silicon cap layer is overgrown. It is found that the interatomic distances ( and ) within the third nearest-neighbor shells in QDs indicate the compressively strained nature of QDs. The present study demonstrates that the MS-EXAFS provides detailed information on the QDs strain and the mixing beyond the nearest neighbors.
- Received 13 August 2004
DOI:https://doi.org/10.1103/PhysRevB.71.245334
©2005 American Physical Society