Abstract
The complex dielectric function of biaxial tensile strained Si grown on a fully relaxed virtual substrate was obtained from spectroscopic ellipsometry measurement in the 2.5–5-eV energy range. Standard critical point (CP) line shapes were fit to numerically obtained second-derivative spectra to extract interband CP parameters. It is shown that the biaxial tensile strain increased the number of ellipsometrically observable CP’s from two to three in the gap region, whereas the CP’s in the region were relatively unaffected. These results compare favorably to previous reports for uniaxially compressed stressed silicon. In particular, the experimentally observed splitting of the gap— and —was in reasonable agreement with calculated expectations— and —using previously reported Si deformation potentials.
- Received 20 October 2004
DOI:https://doi.org/10.1103/PhysRevB.71.245205
©2005 American Physical Society