Complex dielectric function of biaxial tensile strained silicon by spectroscopic ellipsometry

C. J. Vineis
Phys. Rev. B 71, 245205 – Published 29 June 2005

Abstract

The complex dielectric function of biaxial tensile strained Si grown on a fully relaxed Si0.81Ge0.19 virtual substrate was obtained from spectroscopic ellipsometry measurement in the 2.5–5-eV energy range. Standard critical point (CP) line shapes were fit to numerically obtained second-derivative spectra to extract interband CP parameters. It is shown that the biaxial tensile strain increased the number of ellipsometrically observable CP’s from two to three in the E0E1 gap region, whereas the CP’s in the E2 region were relatively unaffected. These results compare favorably to previous reports for uniaxially compressed stressed silicon. In particular, the experimentally observed splitting of the E1 gap—E1(1)=3.310eV and E1(2)=3.437eV—was in reasonable agreement with calculated expectations—E1(1)=3.304eV and E1(2)=3.395eV—using previously reported Si deformation potentials.

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  • Received 20 October 2004

DOI:https://doi.org/10.1103/PhysRevB.71.245205

©2005 American Physical Society

Authors & Affiliations

C. J. Vineis*

  • AmberWave Systems Corporation, 13 Garabedian Drive, Salem, New Hampshire 03079, USA

  • *Present address: M.I.T. Lincoln Laboratory, 244 Wood Street, Lexington, Massachusetts 02420. Electronic address: vineis@ll.mit.edu

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Vol. 71, Iss. 24 — 15 June 2005

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