Abstract
We describe the surface structures following submonolayer Cu deposition on Si(001) and subsequent hydrogen termination as characterized by scanning tunneling microscopy. Cu adsorption at results in a characteristic structure, as previously reported. In addition, occasional structures are observed attributed to Cu in surface interstitial sites. After H termination, the dominant features of the structure remain, but the size and distribution of the structures are significantly altered. Based on the atomic-scale appearance of both the clean and H-terminated structures, we propose that within the structure all surface atoms are Si, with all Cu subsurface, contrary to previous structural models.
- Received 9 September 2004
DOI:https://doi.org/10.1103/PhysRevB.71.153302