Hydrogen termination following Cu deposition on Si(001)

L. A. Baker, A. R. Laracuente, and L. J. Whitman
Phys. Rev. B 71, 153302 – Published 8 April 2005

Abstract

We describe the surface structures following submonolayer Cu deposition on Si(001) and subsequent hydrogen termination as characterized by scanning tunneling microscopy. Cu adsorption at results in a characteristic structure, as previously reported. In addition, occasional structures are observed attributed to Cu in surface interstitial sites. After H termination, the dominant features of the structure remain, but the size and distribution of the structures are significantly altered. Based on the atomic-scale appearance of both the clean and H-terminated structures, we propose that within the structure all surface atoms are Si, with all Cu subsurface, contrary to previous structural models.

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  • Received 9 September 2004

DOI:https://doi.org/10.1103/PhysRevB.71.153302

Authors & Affiliations

L. A. Baker, A. R. Laracuente, and L. J. Whitman

  • Naval Research Laboratory, Washington, DC 20375-5342, USA

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Issue

Vol. 71, Iss. 15 — 15 April 2005

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