Elastic and inelastic deformations of ethylene-passivated tenfold decagonal AlNiCo quasicrystal surfaces

Jeong Young Park, D. F. Ogletree, M. Salmeron, R. A. Ribeiro, P. C. Canfield, C. J. Jenks, and P. A. Thiel
Phys. Rev. B 71, 144203 – Published 19 April 2005

Abstract

The adhesion and friction force properties between a tenfold AlNiCo decagonal quasicrystal and a titanium nitride (TiN)-coated tip were investigated using an atomic force microscope in ultrahigh vacuum. To suppress the strong chemical adhesion found in the clean quasicrystal surfaces, the sample was exposed to ethylene that formed a protective passivating layer. We show that the deformation mechanism of the tip-substrate junction changes from elastic to inelastic at a threshold pressure of 3.8to4.0GPa. Images of the indentation marks left above the threshold pressure indicate the absence of new steps, and indicate that surface damage is not accompanied by formation of slippage planes or dislocations, as found in plastically deforming crystalline materials. This is consistent with the lack of translational periodicity of quasicrystals. The work of adhesion in the inelastic regime is five times larger than in the elastic one, plausibly as a result of the displacement of the passivating layer. In the elastic regime, the friction dependence on load is accurately described by the Derjaguin-Müller-Toporov (DMT) model, consistent with the high hardness of both the TiN tip and the quasicrystal sample. Above the threshold pressure, the friction versus load curve deviates from the DMT model, indicating that chemical bond formation and rupture contribute to the energy dissipation.

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  • Received 10 June 2004
  • Corrected 21 April 2005

DOI:https://doi.org/10.1103/PhysRevB.71.144203

©2005 American Physical Society

Corrections

21 April 2005

Erratum

Publisher's Note: Elastic and inelastic deformations of ethylene-passivated tenfold decagonal Al-Ni-Co quasicrystal surfaces [Phys. Rev. B 71, 144203 (2005)]

Jeong Young Park, D. F. Ogletree, M. Salmeron, R. A. Ribeiro, P. C. Canfield, C. J. Jenks, and P. A. Thiel
Phys. Rev. B 71, 149901 (2005)

Authors & Affiliations

Jeong Young Park, D. F. Ogletree, and M. Salmeron*

  • Materials Sciences Division, Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720

R. A. Ribeiro and P. C. Canfield

  • Ames Laboratory and Department of Physics and Astronomy, Iowa State University, Ames, Iowa 50011

C. J. Jenks and P. A. Thiel

  • Ames Laboratory and Department of Chemistry, Iowa State University, Ames, Iowa 50011

  • *Author to whom correspondence should be addressed. Electronic address: salmeron@stm.lbl.gov

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Issue

Vol. 71, Iss. 14 — 1 April 2005

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