Size scaling of the addition spectra in silicon quantum dots

M. Boehm, M. Hofheinz, X. Jehl, M. Sanquer, M. Vinet, B. Previtali, D. Fraboulet, D. Mariolle, and S. Deleonibus
Phys. Rev. B 71, 033305 – Published 5 January 2005

Abstract

We investigate small artificial quantum dots obtained by geometrically controlled resistive confinement in low mobility silicon-on-insulator nanowires. Addition spectra were recorded at low temperature for various dot areas fixed by lithography. We compare the standard deviation of the addition spectra with theory in the high electron concentration regime. We find that the standard deviation scales as the inverse area of the dot and its absolute value are comparable to the energy spacing of the one-particle spectrum.

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  • Received 21 September 2004

DOI:https://doi.org/10.1103/PhysRevB.71.033305

©2005 American Physical Society

Authors & Affiliations

M. Boehm, M. Hofheinz, X. Jehl, and M. Sanquer*

  • CEA-DRFMC, 17 rue des Martyrs, F-38054 Grenoble, France

M. Vinet, B. Previtali, D. Fraboulet, D. Mariolle, and S. Deleonibus

  • CEA-DRT-LETI, 17 rue des Martyrs F-38054 Grenoble Cedex 9, France

  • *Electronic address: msanquer@cea.fr

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Issue

Vol. 71, Iss. 3 — 15 January 2005

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