Abstract
Investigation of the resident site and the adsorption phase structure of thiolates is of fundamental importance for understanding the formation of self-assembled organic monolayers on metal substrate surfaces. In the present study, we have investigated adsorption of methanethiol, , on the ferromagnetic surface using density functional theory calculations. We find that the dissociative adsorption of forming an adsorbed methylthiolate and an adsorbed atom is energetically favorable, and that the molecule adsorbed at the threefold fcc and hcp hollow sites is most stable. The adsorption energy at the bridge site is only smaller than that at the threefold hollow site, and the adsorption of at the atop site is unstable. For the , and adsorptions, we find that the bond tends to be normal to the surface, whereas for the adsorption it tilts away from the surface normal direction by . The adsorption phase is much less stable. The reduction of the adsorption energy with the increasing coverage is attributed to the repulsive interaction between the adsorbates. Our calculations show that the structure may form in the process of methylthiolate adsorption on due to its adsorption energy being only lower than that for the and structures. We find that there is a charge transfer from the substrate surface atoms to the atoms, and that the bond is strongly polar. The surface atoms bound to have a magnetic moment of , while the surface atoms unbound to have a larger magnetic moment of . The atom in the adsorbed acquires a magnetic moment of .
- Received 21 February 2004
DOI:https://doi.org/10.1103/PhysRevB.70.075410
©2004 American Physical Society