Electronic state calculations of Si quantum dots: Oxidation effects

Masahiko Nishida
Phys. Rev. B 69, 165324 – Published 29 April 2004
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Abstract

Electronic states for the configuration of a Si dihydride backbonded to oxygen on the H-covered surface of spherical Si35H36 quantum dots (QDs) are calculated self-consistently using the extended Hückel-type nonorthogonal tight-binding method. The proposed backbond oxidation accounts for oxidation-induced redshifts in luminescence-peak energy observed in porous Si. It is found that optical transitions between the band edges in the Si QD backbonded to oxygen are dipole allowed as in the H-covered case. A comparison is made with a calculation for the double-bonded oxygen configuration.

  • Received 18 September 2003

DOI:https://doi.org/10.1103/PhysRevB.69.165324

©2004 American Physical Society

Authors & Affiliations

Masahiko Nishida*

  • Physics Department, Kanazawa Institute of Technology, Nonoichi-machi, Ishikawa 921-8501, Japan

  • *Email address: m.nishida@neptune.kanazawa-it.ac.jp

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Vol. 69, Iss. 16 — 15 April 2004

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