Electronic parameters and interfacial properties of GaAs/AlxGa1xAs multiquantum wells grown on (111)A GaAs by metalorganic vapor phase epitaxy

Soohaeng Cho, A. Sanz-Hervás, A. Majerfeld, and B. W. Kim
Phys. Rev. B 68, 035308 – Published 10 July 2003
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Abstract

We report a comprehensive study of the optical and interfacial properties of GaAs/AlxGa1xAs multiquantum wells grown on (111)A GaAs substrates by metalorganic vapor phase epitaxy which allowed the determination of the electronic parameters appropriate for such quantum wells. High-resolution x-ray diffractometry studies indicate an excellent crystal quality and good periodicity for the multiquantum wells and provided their structural parameters accurately. The photoreflectance spectra exhibit all the allowed and almost all the weakly allowed optical transitions between the confined hole and electron states. From an analysis of the photoreflectance spectra it is shown that the quantum well interfaces have an abruptness better than ±1 ML. Photoluminescence spectroscopy was also performed to evaluate independently the roughness of the interfaces and multiquantum well period reproducibility. For a 25-period multiquantum well structure with a well width of 55 Å, a photoluminescence linewidth of 12.5 meV, which corresponds to a combined well-width fluctuation and interface roughness of less than ±1 monolayer over the 25 periods, proves the achievement of heterointerfaces with excellent interfacial quality. From a detailed analysis of the high-order transitions observed in the photoreflectance spectra we determined key quantum well electronic parameters, such as, the heavy-hole valence-band offset Qv=0.33±0.02, the transverse GaAs heavy-hole effective mass mhh=(0.95±0.02)m0, and the light-hole effective mass mlh=0.08m0 in 〈111〉 directions, for 〈111〉-oriented GaAs/AlxGa1xAs quantum well structures.

  • Received 18 October 2002

DOI:https://doi.org/10.1103/PhysRevB.68.035308

©2003 American Physical Society

Authors & Affiliations

Soohaeng Cho, A. Sanz-Hervás*, and A. Majerfeld

  • Department of Electrical and Computer Engineering, CB425, University of Colorado, Boulder, Colorado 80309, USA

B. W. Kim

  • Electronics and Telecommunications Research Institute, P.O. Box 106, Yusong, Taejon 305-600, Korea

  • *On leave from Dpto. de Tecnología Electrónica, E.T.S.I. Telecomunicación, Universidad Politécnica de Madrid, Ciudad Universitaria, 28040 Madrid, Spain.
  • Author to whom correspondence should be addressed. E-mail address: majerfel@spot.colorado.edu

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Vol. 68, Iss. 3 — 15 July 2003

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